The Asian American Bar Association of New York (AABANY) and Chinese Business Lawyers Association (CBLA) will be co-sponsoring a conference called "The U.S. & China: Perspectives on Brand Protection & Intellectual Property." This event will also be presented by the Cardozo Journal of International and Comparative Law in association with the Fashion, Arts, Media & Entertainment (FAME) Center.

The event will feature two moderated panels: 1) U.S. Issues for Chinese Businesses and 2) China Issues for U.S. Businesses. 

Attendees will receive 3 CLE credits.

This event is free and open to the public but registration is required. To RSVP, click on the image above. On the ensuing page, click on the purple "RSVP HERE" button.